Techniques for generating three dimensional structures

England, et al. (2015) Techniques for generating three dimensional structures 8,937,019.

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Abstract

Techniques for forming a three dimensional (3D) feature on a substrate are disclosed. In one exemplary embodiment, the technique may be realized as a method comprising: forming a resist structure on the substrate, the resist structure having a first resist portion with a first thickness, a second resist portion with a second thickness, and a third resist portion with a third thickness, where the first thickness may be less than the second thickness, and where the second thickness may be less than the third thickness; implanting charged particles into the substrate through the first and second resist portions and forming an implanted region in the substrate; and etching the substrate to form the 3D feature on the substrate.

Item Type:	Patent
Divisions :	Faculty of Engineering and Physical Sciences > Electronic Engineering
Authors :	Name Email ORCID England, Jonathan j.england@surrey.ac.uk Martin, Patrick M. Cox, David
Date :	20 January 2015
DOI :	8,937,019
Depositing User :	Clive Harris
Date Deposited :	26 May 2017 12:45
Last Modified :	16 Jan 2019 18:52
URI:	http://epubs.surrey.ac.uk/id/eprint/841205

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