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Combining Dynamic Modelling Codes with Medium Energy Ion Scattering Measurements to Characterise Plasma Doping

England, Jonathan, Möller, W, van den Berg, JA, Rossall, A, Min, WJ and Kim, J (2017) Combining Dynamic Modelling Codes with Medium Energy Ion Scattering Measurements to Characterise Plasma Doping In: 20th International Conference on Ion Beam modification of materials, 30 Oct - 4 Nov 2016, Wellington, New Zealand.

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Plasma doping ion implantation (PLAD) is becoming increasingly important in the manufacture of advanced semiconductor device structures but a fundamental understanding of PLAD is complicated. A model of PLAD into planar substrates has been constructed using the one dimensional computer code TRIDYN to predict collision cascades and hence substrate compositional changes during implantation. Medium Energy Ion Scattering (MEIS) measurements of dopant profiles in PLAD processed samples were used to calibrate the input ion and neutral fluxes to the model. Rules could then be proposed for how post implant profiles should be modified by a cleaning step. This learning was applied to a three dimensional TRI3DYN based model for PLAD implants into FinFET like structures. Comparison of the model to dopant profile measurements made by time of flight (TOF)-MEIS revealed the angular distributions of neutral species and doping mechanisms acting in three dimensional structures.

Item Type: Conference or Workshop Item (Conference Paper)
Divisions : Faculty of Engineering and Physical Sciences > Electronic Engineering
Authors :
Möller, W
van den Berg, JA
Rossall, A
Min, WJ
Kim, J
Date : 2 May 2017
DOI : 10.1016/j.nimb.2017.05.043
Copyright Disclaimer : © 2017. This manuscript version is made available under the CC-BY-NC-ND 4.0 license
Uncontrolled Keywords : : ion-implantation, ion beam modelling, TRIDYN, TRI3DYN, plasma doping, PLAD, FinFET
Related URLs :
Depositing User : Melanie Hughes
Date Deposited : 26 May 2017 17:00
Last Modified : 16 Jan 2019 18:52

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