Technique for improving ion implanter productivity

Chaney, et al. (2008) Technique for improving ion implanter productivity 7,446,326.

Full text not available from this repository.

Abstract

A technique for improving ion implanter productivity is disclosed. In one particular exemplary embodiment, the technique may be realized as a method for improving productivity of an ion implanter having an ion source chamber. The method may comprise supplying a gaseous substance to the ion source chamber, the gaseous substance comprising one or more reactive species for generating ions for the ion implanter. The method may also comprise stopping the supply of the gaseous substance to the ion source chamber. The method may further comprise supplying a hydrogen containing gas to the ion source chamber for a period of time after stopping the supply of the gaseous substance.

Item Type:	Patent
Divisions :	Faculty of Engineering and Physical Sciences > Electronic Engineering
Authors :	Name Email ORCID Chaney, Craig R Low, Russell J. England, Jonathan j.england@surrey.ac.uk
Date :	4 November 2008
DOI :	7,446,326
Depositing User :	Clive Harris
Date Deposited :	26 May 2017 10:31
Last Modified :	16 Jan 2019 18:52
URI:	http://epubs.surrey.ac.uk/id/eprint/841183

Actions (login required)

View Item

Downloads