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Influence of bath temperature and bath composition on Co-Ag electrodeposition

Garcia-Torres, J, Vallés, E and Gómez, E (2010) Influence of bath temperature and bath composition on Co-Ag electrodeposition Electrochimica Acta, 55 (20). pp. 5760-5767.

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A study of the best conditions to prepare smooth heterogeneous Co.Ag films with low amounts of S from a thiourea-based electrolytic bath has been performed. Using a 0.01M AgClO4 + 0.1M Co(ClO4)2 + 0.1M thiourea + 0.1M sodium gluconate + 0.3M H3BO3 + 0.1M NaClO4 bath, low temperature (10°C) allowed obtaining compact and smooth deposits containing 2 wt.% sulphur. Decreasing thiourea content 0.06M and increasing gluconate concentration up to 0.3 M, better deposits (more compact with lower sulphur content (1.2 wt.%)) were obtained. A clear influence of the species present in the bath on the film quality was observed: while gluconate favoured film cohesion, boric acid hindered hydrogen adsorption. For all films, fcc-Ag, hcp-Co and hcp-CoAg3 phases were always detected by XRD, TEM and electron diffraction, their proportions varying with the electrodeposition conditions. Magnetic measurements revealed that the increase in the CoAg3 led to an increase in the film coercivity. GMR values were only measured at cryogenic temperatures, they being higher for the deposits with the lowest sulphur content revealing that sulphur exerts a negative effect on magnetoresistance. © 2010 Elsevier Ltd. All rights reserved.

Item Type: Article
Divisions : Surrey research (other units)
Authors : Garcia-Torres, J, Vallés, E and Gómez, E
Date : 1 August 2010
DOI : 10.1016/j.electacta.2010.05.014
Depositing User : Symplectic Elements
Date Deposited : 17 May 2017 13:20
Last Modified : 24 Jan 2020 23:49

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