Factors Influencing the Minority Carrier Diffusion Length in Multicrystalline Silicon Produced in a HEM Furnace

Heasman, KC, Lesniak, M, Neville, BM, Hughes, AE, Cunningham, DW, Mitchell, AM, Ford, BE, Summers, JG and Bruton, TM (1991) Factors Influencing the Minority Carrier Diffusion Length in Multicrystalline Silicon Produced in a HEM Furnace In: 22rd IEEE PV Spec. Conference, 1991-10-07 - 1991-10-11, Las Vegas.

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Item Type:	Conference or Workshop Item (UNSPECIFIED)
Divisions :	Surrey research (other units)
Authors :	Name Email ORCID Heasman, KC k.heasman@surrey.ac.uk Lesniak, M Neville, BM Hughes, AE Cunningham, DW Mitchell, AM Ford, BE Summers, JG Bruton, TM
Date :	11 October 1991
DOI :	10.1109/PVSC.1991.169362
Contributors :	Contribution Name Email ORCID publisher IEEE,
Depositing User :	Symplectic Elements
Date Deposited :	17 May 2017 12:50
Last Modified :	23 Jan 2020 18:10
URI:	http://epubs.surrey.ac.uk/id/eprint/836943

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