Implantation of silicon using the boron cluster BF2
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Smith, R, Harrison, M and Webb, R (1999) Implantation of silicon using the boron cluster BF2 THIN SOLID FILMS, 343. pp. 602-604.
Full text not available from this repository.Item Type: | Article | ||||||||||||
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Divisions : | Surrey research (other units) | ||||||||||||
Authors : |
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Date : | 1 April 1999 | ||||||||||||
DOI : | 10.1016/S0040-6090(98)01714-3 | ||||||||||||
Uncontrolled Keywords : | Science & Technology, Technology, Physical Sciences, Materials Science, Multidisciplinary, Materials Science, Coatings & Films, Physics, Applied, Physics, Condensed Matter, Materials Science, Physics, MATERIALS SCIENCE, COATINGS & FILMS, MATERIALS SCIENCE, MULTIDISCIPLINARY, PHYSICS, APPLIED, PHYSICS, CONDENSED MATTER, cluster beams, ion implantation, molecular dynamics, MOLECULAR-DYNAMICS | ||||||||||||
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Depositing User : | Symplectic Elements | ||||||||||||
Date Deposited : | 17 May 2017 12:18 | ||||||||||||
Last Modified : | 24 Jan 2020 22:02 | ||||||||||||
URI: | http://epubs.surrey.ac.uk/id/eprint/834803 |
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