Electron field emission from amorphous carbon films as a function of deposition self bias, nitrogen content and substrate resistivity - experiment and simulation

Forrest, RD, Chen, GY and Silva, SRP (2001) Electron field emission from amorphous carbon films as a function of deposition self bias, nitrogen content and substrate resistivity - experiment and simulation In: Taiwan Diamond 2000 Meeting, 2000-07-30 - 2000-08-02, INST ATOMIC MOLECULAR SCI ACAD SINICA, TAIPEI, TAIWAN.

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Item Type:	Conference or Workshop Item (UNSPECIFIED)
Divisions :	Surrey research (other units)
Authors :	Name Email ORCID Forrest, RD Chen, GY Silva, SRP s.silva@surrey.ac.uk
Date :	1 November 2001
DOI :	10.1016/S0254-0584(01)00437-0
Contributors :	Contribution Name Email ORCID publisher ELSEVIER SCIENCE SA,
Uncontrolled Keywords :	Science & Technology, Technology, Materials Science, Multidisciplinary, Materials Science, MATERIALS SCIENCE, MULTIDISCIPLINARY, CVD, field emission, amorphous materials
Related URLs :	Author
Depositing User :	Symplectic Elements
Date Deposited :	17 May 2017 11:48
Last Modified :	23 Jan 2020 17:16
URI:	http://epubs.surrey.ac.uk/id/eprint/832754

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