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Novel types of silicon waveguides fabricated using proton beam irradiation

Teo, EJ, Yang, P, Xiong, BQ, Breese, MBH, Mashanovich, GZ, Ow, YS, Reed, GT and Bettiol, AA (2010) Novel types of silicon waveguides fabricated using proton beam irradiation In: Silicon Photonics V, 2010-01-24 - 2010-01-27, San Francisco, USA.

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In this work, we describe the use of a combination of proton beam irradiation and electrochemical etching to fabricate high index-contrast waveguides directly in silicon without the need for silicon-on-insulator substrate. Various types of waveguides with air or porous silicon cladding have been demonstrated. We show that porous silicon (PS) is a flexible cladding material due to the tunability of its refractive index and thickness. The Si/PS waveguide system also possesses better transmittance in the ranges of 1.2-9 and 23-200 μm, compared to Si/SiO2 waveguides. This is potentially important for mid and far-IR applications. Since it is compatible with conventional CMOS technology, this process can be used for fabrication of integrated optoelectronics circuits.

Item Type: Conference or Workshop Item (UNSPECIFIED)
Divisions : Surrey research (other units)
Authors :
Teo, EJ
Xiong, BQ
Breese, MBH
Ow, YS
Bettiol, AA
Date : 2010
DOI : 10.1117/12.841536
Contributors :
Depositing User : Symplectic Elements
Date Deposited : 17 May 2017 11:18
Last Modified : 23 Jan 2020 16:42

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