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Inverted method for fabricating a nano-aperture device with subwavelength structures

Suutala, A, Olkkonen, J, Cox, DC, Lappalainen, J and Jantunen, H (2009) Inverted method for fabricating a nano-aperture device with subwavelength structures JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 27 (6). pp. 2457-2461.

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Item Type: Article
Divisions : Faculty of Engineering and Physical Sciences > Electronic Engineering > Advanced Technology Institute > Nano-Electronics Centre
Authors :
Suutala, A
Olkkonen, J
Cox, DC
Lappalainen, J
Jantunen, H
Date : 1 November 2009
DOI : 10.1116/1.3263225
Uncontrolled Keywords : Science & Technology, Technology, Physical Sciences, Engineering, Electrical & Electronic, Nanoscience & Nanotechnology, Physics, Applied, Engineering, Science & Technology - Other Topics, Physics, aluminium, atomic force microscopy, electron beam deposition, focused ion beam technology, nanopatterning, nanostructured materials, organic compounds, plasmonics, scanning electron microscopy, ENHANCED LIGHT TRANSMISSION, OPTICAL-TRANSMISSION, HOLE ARRAYS, SURFACE, CORRUGATIONS
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Additional Information : Copyright 2009 American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics.The following article appeared in Journal of Vacuum Science & Technology B, 27 (6) and may be found at
Depositing User : Symplectic Elements
Date Deposited : 30 Nov 2012 11:03
Last Modified : 31 Oct 2017 14:50

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