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Freestanding waveguides in silicon

Yang, PY, Mashanovich, GZ, Gomez-Morilla, I, Headley, WR, Reed, GT, Teo, EJ, Blackwood, DJ, Breese, MBH and Bettiol, AA (2007) Freestanding waveguides in silicon Applied Physics Letters, 90 (24), 241109.

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Using a direct-write process for the production of three dimensional microstructures on a semiconductor, freestanding waveguides have been realized in silicon. The waveguides are produced by a focused beam of high energy protons that is scanned over a silicon substrate. The latent image of the scan is subsequently developed by electrochemical etching. Herein the authors report on the fabrication method as well as determining the propagation loss of these structures. Propagation loss values of 13.4 and 14.6 dB/cm were obtained for these preliminary structures for transverse electric and transverse magnetic polarizations, respectively.

Item Type: Article
Divisions : Faculty of Engineering and Physical Sciences > Electronic Engineering > Advanced Technology Institute > Photonics
Authors :
Yang, PY
Mashanovich, GZ
Gomez-Morilla, I
Headley, WR
Reed, GT
Teo, EJ
Blackwood, DJ
Breese, MBH
Bettiol, AA
Date : 11 June 2007
DOI : 10.1063/1.2749175
Depositing User : Mr Adam Field
Date Deposited : 14 Sep 2011 11:12
Last Modified : 31 Oct 2017 14:08

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