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Electron delocalization in amorphous carbon by ion implantation

Khan, R. U. A., Carey, JD, Silva, S. R. P., Jones, B. J. and Barklie, R. C. (2001) Electron delocalization in amorphous carbon by ion implantation Physical Review B, 63 (121201).


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The electrical properties of amorphous carbon are governed by the high localization of the sp2 π states, and conventional methods of altering the sp2 content result in macroscopic graphitization. By using ion beams we have achieved a delocalization of the π states by introducing nanoclustering and hence improving the connectivity between existing clusters, as demonstrated by the increase in the conductivity by two orders of magnitude without modification of the band gap. At higher doses, paramagnetic relaxation-time measurements indicate that exchange effects are present. This unveils the possibility of amorphous carbon-based electronics by tailoring the ion-beam conditions, which we demonstrate in the form of a rectifying device.

Item Type: Article
Divisions : Faculty of Engineering and Physical Sciences > Electronic Engineering > Advanced Technology Institute > Nano-Electronics Centre
Authors :
Khan, R. U. A.
Silva, S. R.
Jones, B. J.
Barklie, R. C.
Date : 5 March 2001
DOI : 10.1103/PhysRevB.63.121201
Additional Information : Published in Physical Review B, 63, 121201 . © 2001 The American Physical Society.
Depositing User : Mr Adam Field
Date Deposited : 27 May 2010 14:38
Last Modified : 06 Jul 2019 05:06

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