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Items where Academic/Research unit is "Faculty of Engineering and Physical Sciences > Electronic Engineering > Advanced Technology Institute > Nano-Electronics Centre"

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Amaratunga, GAJ and Silva, SRP (1996) Nitrogen containing hydrogenated amorphous carbon for thin-film field emission cathodes APPLIED PHYSICS LETTERS, 68 (18). pp. 2529-2531.


Carey, JD, Donegan, JF, Barklie, RC, Priolo, F, Franzo, G and Coffa, S (1996) Electron paramagnetic resonance of erbium doped silicon Applied Physics Letters, 69 (25). pp. 3854-3856.

Clay, KJ, Speakman, SP, Amaratunga, GAJ and Silva, SRP (1996) Characterization of C:H:N deposition from CH4/N-2 rf plasmas using optical emission spectroscopy JOURNAL OF APPLIED PHYSICS, 79 (9). pp. 7227-7233.


Franceschini, DF, Freire, FL and Silva, SRP (1996) Influence of precursor gases on the structure of plasma deposited amorphous hydrogenated carbon-nitrogen films APPLIED PHYSICS LETTERS, 68 (19). pp. 2645-2647.


Pharr, GM, Callahan, DL, McAdams, SD, Tsui, TY, Anders, S, Anders, A, Ager, JW, Brown, IG, Bhatia, CS, Silva, SRP and Robertson, J (1996) Hardness, elastic modulus, and structure of very hard carbon films produced by cathodic-arc deposition with substrate pulse biasing APPLIED PHYSICS LETTERS, 68 (6). pp. 779-781.


Schwan, J, Ulrich, S, Batori, V, Ehrhardt, H and Silva, SRP (1996) Raman spectroscopy on amorphous carbon films JOURNAL OF APPLIED PHYSICS, 80 (1). pp. 440-447.

Schwan, J, Ulrich, S, Roth, H, Ehrhardt, H, Silva, SRP, Robertson, J, Samlenski, R and Brenn, R (1996) Tetrahedral amorphous carbon films prepared by magnetron sputtering and dc ion plating JOURNAL OF APPLIED PHYSICS, 79 (3). pp. 1416-1422.

Silva, S Ravi P, Xu, Shi, Tay, B X, Tan, H S and Milne, W I (1996) Nanocrystallites in Tetrahedral Amorphous Carbon Films Applied Physics Letters, 69 (4). pp. 491-493.

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