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Current, M. I., Lopes, D., Foad, M.A., England, Jonathan, Jones, C. and Su, D. (1998) 200 eV–10 keV boron implantation and rapid thermal annealing: Secondary ion mass spectroscopy and transmission electron microscopy study Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 16 (1). pp. 327-333.

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