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England, Jonathan, Current, Michael I., Kamata, T., Malone, Phil and Ito, Hiro (1994) Charge neutralisation during high-current ion implantation Solid State Technology. pp. 115-118.


Wauk, Michael T., Castle, Matt, England, Jonathan and Current, Michael (1994) Controlling heavy metal and dopant contamination during ion implantation Microcontamination, 12 (10). pp. 29-37.

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