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Items where Author is "Willoughby, A"

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El Mubarek, H. A. W., Karunaratne, M., Bonar, J. M., Dilliway, G. D., Wang, Y., Hemment, P. L. F., Willoughby, A. F. and Ashburn, P. (2005) Effect of fluorine implantation dose on boron transient enhanced diffusion and boron thermal diffusion in Si<sub>1-<i>x</i></sub>Ge<sub><i>x</sub></i> x, 52 (4). pp. 518-526.

El Mubarek, H A, Karunaratne, M, Bonar, J M, Dilliway, G D, Wang, Y, Hemment, P L, Willoughby, A F and Ashburn, P (2005) Effect of Fluorine Implantation Dose on Boron Transient Enhanced Diffusion and Boron Thermal Diffusion in S1-xGex IEEE Transactions on Electron Devices, 52 (4).

El Mubarek, H A, Bonar, J M, Dilliway, G D, Ashburn, P, Karunaratne, M, Willoughby, A F, Wang, Y, Hemment, P L, Price, R, Zhang, J and Ward, P (2004) Effect of Fluorine Implantation Dose on Boron Thermal Diffusion in Silicon Journal of Applied Physics, 96 (8).

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