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Items where Author is "Rossall, A"

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Number of items: 5.

Article

van den Berg, Jaap, Rossall, Andrew and England, Jonathan (2019) Characterization of arsenic plasma doping and postimplant processing of silicon using medium energy ion scattering Journal of Vacuum Science & Technology B, 37 (3), 032901. 032901-1 - 032901-10.

England, Jonathan, Van den Berg, Jaap and Rossall, Andrew (2019) Use of TRIDYN and medium energy ion scattering to calibrate an industrial arsenic plasma doping process Journal of Vacuum Science & Technology B, 37 (3), 031206. 031206-1 - 031206-10.

Conference or Workshop Item

Van den Berg, JA, Rossall, AK and England, J (2019) Arsenic plasma doping in Si characterized by high resolution medium energy ion scattering depth profile analysis In: 22nd International Conference on Ion Implantation Technology, 16 - 21 September 2018, Wurzburg, Germany.

England, Jonathan, Möller, W, van den Berg, JA, Rossall, A, Min, WJ and Kim, J (2017) Combining Dynamic Modelling Codes with Medium Energy Ion Scattering Measurements to Characterise Plasma Doping In: 20th International Conference on Ion Beam modification of materials, 30 Oct - 4 Nov 2016, Wellington, New Zealand.

England, Jonathan, van den Berg, J.A., Rossall, A.K., Alencar, I., Marmit, G.G., Trombini, H. and Grande, P.L. (2016) Combining Medium Energy Ion Scattering measurements with TRIDYN dynamic modelling to characterise a plasma doping process In: 8th International Workshop on High-Resolution Depth Profiling 2016, 7-11 Aug 2016, Western University, London, Ontario, Canada.

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