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Items where Author is "Low, R"

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Boudreault, G, Claudio, G, Jeynes, C, Low, R and Sealy, BJ (2004) Accurate calibration of the retained fluence from a versatile single wafer implanter using RBS NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 217 (1). pp. 177-182.

Claudio, G, Kirkby, K J, Bersani, M, Low, R, Sealy, B J and Gwilliam, R (2004) Effect of the Tilt Angle on Antimony in Silicon Implanted Wafers Journal of Applied Physics, 95 (10).

Claudio, G, Jeynes, C, Kirkby, KJ, Sealy, BJ, Gwilliam, R, Low, R, Brown, B, Alford, TL, Nastasi, M and Vella, MC (2003) Electrical behaviour of arsenic implanted silicon wafers at large tilt angle IIT2002: ION IMPLANTATION TECHNOLOGY, PROCEEDINGS. pp. 614-617.

Conference or Workshop Item

Claudio, G, Boudreault, G, Jeynes, C, Sealy, BJ, Low, R, Brown, B, Alford, TL, Nastasi, M and Vella, MC (2003) Absolute dose performance of the SWIFT single wafer ion implanter In: 14th International Conference on Ion Implantation Technology, 2002-09-18 - 2002-09-27, TAOS, NM.


Low, et al. (2009) Techniques for preventing parasitic beamlets from affecting ion implantation 7,482,598.

Low, et al. (2009) Techniques for reducing effects of photoresist outgassing 7,476,878.

Chaney, et al. (2008) Technique for improving ion implanter productivity 7,446,326.

Low, et al. (2008) Methods and apparatus for glitch recovery in stationary-beam ion implantation process using fast ion beam control 7,361,913.

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