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Items where Author is "Delabie, A"

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Article

Swerts, J, Fedorenko, Y, Maes, JW, Tois, E, Delabie, A, Ragnarsson, LA, Yu, HY, Nyns, L, Adelmann, C and Van Elshocht, S (2007) ALD La-based oxides for vt-tuning in high-k/metal gate stacks ECS Transactions, 11 (7). pp. 201-211.

Delabie, A, Nyns, L, Bellenger, F, Caymax, M, Conard, T, Franquet, A, Houssa, M, Lin, D, Meuris, M, Ragnarsson, LA, Sioncke, S, Swerts, J, Fedorenko, Y, Maes, JW, Van Elshocht, S and De Gendt, S (2007) Atomic Layer Deposition of hafnium based gate dielectric layers for CMOS applications ECS Transactions, 11 (7). pp. 227-241.

Delabie, A, Pourtois, G, Caymax, M, De Gendt, S, Ragnarsson, LA, Heyns, M, Fedorenko, Y, Swerts, J and Maes, JW (2007) Atomic layer deposition of hafnium silicate gate dielectric layers Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, 25 (4). pp. 1302-1308.

Fedorenko, Y, Swerts, J, Maes, JW, Tois, E, Haukka, S, Wang, CG, Wilk, G, Delabie, A, Deweerd, W and De Gendt, S (2007) Atomic layer deposition of hafnium silicate from HfCl4, SiCl4, and H2O Electrochemical and Solid-State Letters, 10 (5). pp. 149-152.

Swerts, J, Deweerd, W, Wang, CG, Fedorenko, Y, Delabie, A, Shero, E, Zhao, C, Maes, JW, De Gendt, S and Wilk, G (2006) Highly scalable ALD-deposited hafnium silicate gate stacks for low standby power applications Materials Research Society Symposium Proceedings, 917. pp. 155-160.

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