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Items where Author is "Davis, J. R."

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Godfrey, D. J., Chater, R., Robinson, A. K., Augustus, P. D., Alderman, J. R., Davis, J. R., Kilner, J. and Hemment, P. L. F. (1988) Measurement and modelling of arsenic and boron diffusion in oxygen implanted silicon-on-insulator (SOI) layers IEEE Proceedings of the 1988 SOS/SOI Technology Workshop.

Robinson, A. K., Reeson, K. J. , Hemment, P. L. F., Thomas, N., Davis, J. R., Christensen, K. N., Marsh, C., Booker, G. R., Kilner, J. A. and Chater, R. J. (1988) Total dielectric isolation (TDI) of silicon device islands by a single O+implantation stage IEEE Proceedings of the 1988 SOS/SOI Technology Workshop .

Thomas, N. J., Davis, J. R., Reeson, K. J., Hemment, P. L. F., Keen, J., Castledine, J., Brumhead, D., Goulding, M., Alderman, J., Farr, J. P. G. and Earwaker, L. G. (1988) A comparison of fully depleted SOI-CMOS transistors in FIPOS and SIMOX substrates IEEE Proceedings of the 1988 SOS/SOI Technology Workshop.

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