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Items where Author is "Armour, D"

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Number of items: 12.

Article

England, Jonathan, Cook, C.E.A., Armour, D.G. and Foad, M.A. (1995) Charged particle energy spectrometers and their applications in fundamental studies of wafer charging and ion beam tuning phenomena Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 96 (1-2). pp. 39-42.

Donnelly, S, Ingram, D, Webb, R and Armour, D (1979) On the difficulties in interpreting thermal evolution spectra Vacuum, 29 (8-9). pp. 303-307.

Conference or Workshop Item

Foad, M.A., England, Jonathan, Moffatt, S. and Armour, D.G. (1997) Analysis of sub-1keV Implants in Silicon using SIMS, SRP, MEISS and DLTS: The xRLEAP Low Energy, High Current Implanter Evaluated In: 11th International Conference on Ion Implantation Technology, 16-21 Jun 1996, Austin, Texas, USA.

England, Jonathan, Joyce, L., Burgess, C., Moffatt, S., Foad, M., Armour, D. and Current, M. (1997) The Applied Materials xRLEAP ion implanter for ultra shallow junction formation In: 11th International Conference on Ion Implantation Technology, 16-21 Jun 1996, Austin, Texas, USA.

Hatzopoulos, N., Suder, S., van den Berg, J.A., Donnelly, S.E., Cook, C.E.A., Armour, D.G., Panknin, D., Fukarek, W., Lucassen, M., Frey, L., Foad, M.A., England, Jonathan, Moffatt, S., Bailey, P., Noakes, C.T. and Ohno, H. (1997) Range and damage distributions in ultra-low energy boron implantation into silicon In: 11th International Conference on Ion Implantation Technology, 16-21 Jun 1996, Austin, Texas, USA.

England, Jonathan, Cook, C., Armour, D. and Foad, M. (1995) Charged particle energy spectrometers and their applications in fundamental studies of wafer charging and ion beam tuning phenomena In: Ion Implantation Technology 94 (IIT 94), 13-17 Jun 1994, Catania, Italy.

Foad, M., Armour, D., Kilmes, Z., Hilton, B., Van den Berg, J., Cook, C., Chew, A., Sykes, D., England, Jonathan, Devaney, A., Ito, H., Bryan, N., Plumb, F., Kindersley, P. and Moffatt, S. (1995) Dedicated Test Facility for Ion Beam Quality Evaluation and Spectroscopies In: Ion Implantation Technology 94 (IIT 94), 13-17 Jun 1994, Catania, Italy.

Foad, M., Armour, D. and England, Jonathan (1995) The Use of KOBRA for Implanter Beamline Design and Optimisation In: Ion Implantation Technology 94 (IIT 94), 13-17 Jun 1994, Catania, Italy.

England, Jonathan, Bryan, N., Ito, H., Armour, D., Van den Berg, J., Fotheringham, I. and Kindersley, P. (1993) Measurement of Beam Potentials and Surface Voltages on Semiconductor Wafers Using an Ion Spectrometer In: Ninth International Conference on Ion Implantation Technology (IIT 92), Sep 20-24, 1992, Gainesvile, Florida, USA.

Patent

England, et al. (1999) Ion implanter with post mass selection deceleration 5,969,366.

Armour, et al. (1995) Spectrum analyzer in an ion implanter 5,457,324.

Armour, et al. (1995) Spectrum analyzer in an ion implanter 5,384,465.

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