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Chemical vapor deposition of layered two-dimensional MoSi2N4 materials

Hong, Yi Lun, Liu, Zhibo, Wang, Lei, Zhou, Tianya, Ma, Wei, Xu, Chuan, Feng, Shun, Chen, Long, Chen, Mao-Lin, Sun, Dong-Ming , Chen, Xing-Qiu, Cheng, Hui-ming and Ren, Wencai (2020) Chemical vapor deposition of layered two-dimensional MoSi2N4 materials Science, 369, 6504.

Full text not available from this repository.
Item Type: Article
Divisions : Faculty of Engineering and Physical Sciences > Electronic Engineering
Authors :
NameEmailORCID
Hong, Yi Lun
Liu, Zhibo
Wang, Lei
Zhou, Tianya
Ma, Wei
Xu, Chuan
Feng, Shun
Chen, Long
Chen, Mao-Lin
Sun, Dong-Ming
Chen, Xing-Qiu
Cheng, Hui-minghuiming.cheng@surrey.ac.uk
Ren, Wencai
Date : 7 August 2020
DOI : 10.1126/science.abb7023
Copyright Disclaimer : Copyright © 2020, Copyright © 2020 The Authors, some rights reserved; exclusive licensee American Association for the Advancement of Science. No claim to original U.S. Government Works. https://www.sciencemag.org/about/science-licenses-journal-article-reuseThis is an article distributed under the terms of the Science Journals Default License.
Additional Information : Embargo OK Metadata OK Require accepted manuscript version from author.
Depositing User : James Marshall
Date Deposited : 10 Aug 2020 12:57
Last Modified : 10 Aug 2020 12:57
URI: http://epubs.surrey.ac.uk/id/eprint/858381

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