Chemical vapor deposition of layered two-dimensional MoSi2N4 materials
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Hong, Yi Lun, Liu, Zhibo, Wang, Lei, Zhou, Tianya, Ma, Wei, Xu, Chuan, Feng, Shun, Chen, Long, Chen, Mao-Lin, Sun, Dong-Ming , Chen, Xing-Qiu, Cheng, Hui-ming and Ren, Wencai (2020) Chemical vapor deposition of layered two-dimensional MoSi2N4 materials Science, 369, 6504.
Full text not available from this repository.Item Type: | Article | ||||||||||||||||||||||||||||||||||||||||||
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Divisions : | Faculty of Engineering and Physical Sciences > Electronic Engineering | ||||||||||||||||||||||||||||||||||||||||||
Authors : |
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Date : | 7 August 2020 | ||||||||||||||||||||||||||||||||||||||||||
DOI : | 10.1126/science.abb7023 | ||||||||||||||||||||||||||||||||||||||||||
Copyright Disclaimer : | Copyright © 2020, Copyright © 2020 The Authors, some rights reserved; exclusive licensee American Association for the Advancement of Science. No claim to original U.S. Government Works. https://www.sciencemag.org/about/science-licenses-journal-article-reuseThis is an article distributed under the terms of the Science Journals Default License. | ||||||||||||||||||||||||||||||||||||||||||
Additional Information : | Embargo OK Metadata OK Require accepted manuscript version from author. | ||||||||||||||||||||||||||||||||||||||||||
Depositing User : | James Marshall | ||||||||||||||||||||||||||||||||||||||||||
Date Deposited : | 10 Aug 2020 12:57 | ||||||||||||||||||||||||||||||||||||||||||
Last Modified : | 10 Aug 2020 12:57 | ||||||||||||||||||||||||||||||||||||||||||
URI: | http://epubs.surrey.ac.uk/id/eprint/858381 |
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