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Chemical vapor deposition of layered two-dimensional MoSi2N4 materials

Hong, Yi Lun, Liu, Zhibo, Wang, Lei, Zhou, Tianya, Ma, Wei, Xu, Chuan, Feng, Shun, Chen, Long, Chen, Mao-Lin, Sun, Dong-Ming , Chen, Xing-Qiu, Cheng, Hui-ming and Ren, Wencai (2020) Chemical vapor deposition of layered two-dimensional MoSi2N4 materials Science, 369, 6504.

Full text not available from this repository.
Item Type: Article
Divisions : Faculty of Engineering and Physical Sciences > Electronic Engineering
Authors :
Hong, Yi Lun
Liu, Zhibo
Wang, Lei
Zhou, Tianya
Ma, Wei
Xu, Chuan
Feng, Shun
Chen, Long
Chen, Mao-Lin
Sun, Dong-Ming
Chen, Xing-Qiu
Ren, Wencai
Date : 7 August 2020
DOI : 10.1126/science.abb7023
Copyright Disclaimer : Copyright © 2020, Copyright © 2020 The Authors, some rights reserved; exclusive licensee American Association for the Advancement of Science. No claim to original U.S. Government Works. is an article distributed under the terms of the Science Journals Default License.
Additional Information : Embargo OK Metadata OK Require accepted manuscript version from author.
Depositing User : James Marshall
Date Deposited : 10 Aug 2020 12:57
Last Modified : 10 Aug 2020 12:57

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