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Room temperature synthesis of HfO2/HfO x heterostructures by ion-implantation

Nandi, Sanjoy Kumar, Venkatachalam, Dinesh Kumar, Ruffell, Simon, England, Jonathan, Grande, Pedro Luis, Vos, Maarten and Elliman, Robert Glen (2018) Room temperature synthesis of HfO2/HfO x heterostructures by ion-implantation Nanotechnology, 29 (42), 425601. pp. 1-9.

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Abstract

Implantation of Hf films with oxygen ions is shown to be an effective means of fabricating high-quality HfO2/HfO x heterostructures at room temperature, with the layer composition and thicknesses determined by the ion energy and fluence. Implantation with 3 keV O+ ions to a fluence of 1 × 1017 ions cm−2 produces a polycrystalline (monoclinic-) HfO2 layer extending from the surface to a depth of ~12 nm, and an underlying graded HfO x layer extending an additional ~7 nm, while implantation with 6 keV O to a similar fluence produces a near-stoichiometric surface layer of 7 nm thickness and a graded substoichiometric layer extending to depth of ~30 nm. These structures are shown to be broadly consistent with oxygen range data but more detailed comparison with dynamic Monte Carlo simulations suggests that the near-surface region contains more oxygen than expected from collisional processes alone. The bandgap and dielectric strength of the HfO2 layer produced by 3 keV; 1 × 1017 ions cm−2 implant is shown to be indistinguishable from those of an amorphous film deposited by atomic layer deposition at 200 °C. The utility of these layers is demonstrated by studying the resistive switching properties of metal-oxide-metal test structures fabricated by depositing a top metal contact on the implanted film. These results demonstrate the suitability of ion-implantation for the synthesis of functional oxide layers at room temperature.

Item Type: Article
Divisions : Faculty of Engineering and Physical Sciences > Electronic Engineering
Authors :
NameEmailORCID
Nandi, Sanjoy Kumar
Venkatachalam, Dinesh Kumar
Ruffell, Simon
England, Jonathanj.england@surrey.ac.uk
Grande, Pedro Luis
Vos, Maarten
Elliman, Robert Glen
Date : 15 August 2018
DOI : 10.1088/1361-6528/aad756
Copyright Disclaimer : © 2018 IOP Publishing Ltd
Depositing User : Clive Harris
Date Deposited : 17 Sep 2018 13:06
Last Modified : 30 Oct 2019 12:54
URI: http://epubs.surrey.ac.uk/id/eprint/849302

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