University of Surrey

Test tubes in the lab Research in the ATI Dance Research

Sidewall doping mechanism and doping profile tuning on 3D structure by plasma doping

Wang, Cuiyang, England, Jonathan, Gossmann, Hans, Persing, Harold, Miller, Tim, Gao, Qi, Tang, Shan and Salimian, Siamak (2017) Sidewall doping mechanism and doping profile tuning on 3D structure by plasma doping In: 2017 17th International Workshop on Junction Technology (IWJT), 01-02 Jun 2017, Uji, Japan.

[img] Text
Sidewall doping mechanism and doping profile tuning on 3D structure by plasma doping.docx

Download (2MB)

Abstract

In this paper the primary mechanisms for the plasma doping (PLAD) of 3D structures – direct implant, scattered implant, deposition & knock-in, and sputtering (etching) – are discussed. The TRI3DYN code was used to elucidate the roles these various doping mechanisms play. Through-fin SIMS profiles for an arsenic plasma doping process were calculated from the model and compared to experimental results. Further, by adjusting the competition and balance among these different doping mechanisms, we also demonstrate that the doping profile can be tuned on 3D fin structures for a boron plasma doping process.

Item Type: Conference or Workshop Item (Conference Paper)
Divisions : Faculty of Engineering and Physical Sciences > Electronic Engineering
Authors :
NameEmailORCID
Wang, Cuiyang
England, Jonathanj.england@surrey.ac.uk
Gossmann, Hans
Persing, Harold
Miller, Tim
Gao, Qi
Tang, Shan
Salimian, Siamak
Date : 2 June 2017
Identification Number : 10.23919/IWJT.2017.7966515
Copyright Disclaimer : © 2017 IEEE. Personal use of this material is permitted. Permission from IEEE must be obtained for all other users, including reprinting/ republishing this material for advertising or promotional purposes, creating new collective works for resale or redistribution to servers or lists, or reuse of any copyrighted components of this work in other works
Uncontrolled Keywords : Doping; Plasmas; Semiconductor process modeling; Three-dimensional displays; Implants; Ions; Sputtering
Related URLs :
Additional Information : Print version published by Curran Associates Inc. ISBN: 9781538607794
Depositing User : Clive Harris
Date Deposited : 08 Feb 2018 10:56
Last Modified : 09 Feb 2018 08:27
URI: http://epubs.surrey.ac.uk/id/eprint/845778

Actions (login required)

View Item View Item

Downloads

Downloads per month over past year


Information about this web site

© The University of Surrey, Guildford, Surrey, GU2 7XH, United Kingdom.
+44 (0)1483 300800