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Effects of Ar and O2 Plasma Etching on Parylene C: Topography versus Surface Chemistry and the Impact on Cell Viability

Kontziampasis, D, Trantidou, T, Regoutz, A, Humphrey, EJ, Carta, Daniela, Terracciano, C and Prodromakis, T (2015) Effects of Ar and O2 Plasma Etching on Parylene C: Topography versus Surface Chemistry and the Impact on Cell Viability Plasma Processes and Polymers, 138. pp. 324-333.

Full text not available from this repository.
Item Type: Article
Divisions : Faculty of Engineering and Physical Sciences > Chemistry
Authors :
NameEmailORCID
Kontziampasis, DUNSPECIFIEDUNSPECIFIED
Trantidou, TUNSPECIFIEDUNSPECIFIED
Regoutz, AUNSPECIFIEDUNSPECIFIED
Humphrey, EJUNSPECIFIEDUNSPECIFIED
Carta, Danielad.carta@surrey.ac.ukUNSPECIFIED
Terracciano, CUNSPECIFIEDUNSPECIFIED
Prodromakis, TUNSPECIFIEDUNSPECIFIED
Date : 17 August 2015
Identification Number : 10.1002/ppap.201500053
Uncontrolled Keywords : atomic force microscopy; cell viability; Parylene C; plasma nanoscience; X-ray photoelectron spectroscopy
Depositing User : Jane Hindle
Date Deposited : 04 Sep 2017 13:14
Last Modified : 04 Sep 2017 13:14
URI: http://epubs.surrey.ac.uk/id/eprint/842155

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