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Reduction of Boron Cross Contamination During Arsenic Implantation in the Applied Materials Precision Implant 9500

Horvath, J., Little, N., Rigsby, D., Anthony, M. and England, Jonathan (1995) Reduction of Boron Cross Contamination During Arsenic Implantation in the Applied Materials Precision Implant 9500 In: Ion Implantation Technology 94 (IIT 94), 13-17 Jun 1994, Catania, Italy.

Full text not available from this repository.
Item Type: Conference or Workshop Item (Conference Paper)
Divisions : Faculty of Engineering and Physical Sciences > Electronic Engineering
Authors :
NameEmailORCID
Horvath, J.UNSPECIFIEDUNSPECIFIED
Little, N.UNSPECIFIEDUNSPECIFIED
Rigsby, D.UNSPECIFIEDUNSPECIFIED
Anthony, M.UNSPECIFIEDUNSPECIFIED
England, Jonathanj.england@surrey.ac.ukUNSPECIFIED
Date : 16 May 1995
Copyright Disclaimer : © North Holland 1995
Contributors :
ContributionNameEmailORCID
http://www.loc.gov/loc.terms/relators/EDTCoffa, S.UNSPECIFIEDUNSPECIFIED
http://www.loc.gov/loc.terms/relators/EDTFerla, GUNSPECIFIEDUNSPECIFIED
http://www.loc.gov/loc.terms/relators/EDTRimini, E.UNSPECIFIEDUNSPECIFIED
http://www.loc.gov/loc.terms/relators/EDTPriolo, F.UNSPECIFIEDUNSPECIFIED
Additional Information : Publisher: North Holland
Depositing User : Clive Harris
Date Deposited : 15 Jun 2017 10:54
Last Modified : 15 Jun 2017 15:05
URI: http://epubs.surrey.ac.uk/id/eprint/841397

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