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A Demonstration using the THOR Monitor that Beam Quality Can Affect Device Yield

Malone, P., Shull, W., England, Jonathan and Fotheringham, I. (1995) A Demonstration using the THOR Monitor that Beam Quality Can Affect Device Yield In: Ion Implantation Technology 94 (IIT 94), 13-17 Jun 1994, Catania, Italy.

Full text not available from this repository.
Item Type: Conference or Workshop Item (Conference Paper)
Divisions : Faculty of Engineering and Physical Sciences > Electronic Engineering
Authors :
NameEmailORCID
Malone, P.UNSPECIFIEDUNSPECIFIED
Shull, W.UNSPECIFIEDUNSPECIFIED
England, Jonathanj.england@surrey.ac.ukUNSPECIFIED
Fotheringham, I.UNSPECIFIEDUNSPECIFIED
Date : 16 May 1995
Copyright Disclaimer : © North Holland 1995
Contributors :
ContributionNameEmailORCID
http://www.loc.gov/loc.terms/relators/EDTCoffa, S.UNSPECIFIEDUNSPECIFIED
http://www.loc.gov/loc.terms/relators/EDTFerla, G.UNSPECIFIEDUNSPECIFIED
http://www.loc.gov/loc.terms/relators/EDTRimini, E.UNSPECIFIEDUNSPECIFIED
http://www.loc.gov/loc.terms/relators/EDTPriolo, F.UNSPECIFIEDUNSPECIFIED
Additional Information : Publisher: North Holland
Depositing User : Clive Harris
Date Deposited : 15 Jun 2017 09:57
Last Modified : 15 Jun 2017 09:57
URI: http://epubs.surrey.ac.uk/id/eprint/841387

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