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Elemental analysis of ion implantation added particles

England, Jonathan, McLaren, M., Mitchell, R. and Uritsky, Y. (1997) Elemental analysis of ion implantation added particles In: 11th International Conference on Ion Implantation Technology, 16-21 Jun 1996, Austin, Texas, USA.

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Abstract

Defect reduction programs often start by using size distributions and locations on wafers to give clues as to the origin of particles. The analysis of trends in the composition of the particles allows further information to be gathered. The morphology and elemental composition of particles added during implants using two Applied Materials implanters have been studied. The position and size of particles were first measured using a Tencor Surfscan 6200 and pre-and post-implant measurements used to determine which particles were added during the implant. The wafers were then taken to an analysis centre and placed in a SEM whose travelling stage could accept 200 mm wafers. Converting the co-ordinates measured in the Surfscan to those applicable to the SEM allowed the particles to be found, imaged and analysed by X-ray energy dispersive spectroscopy. This paper discusses these results and includes some examples that show how elemental identification has been used to identify particle sources, allowing them to be eliminated.

Item Type: Conference or Workshop Item (Conference Paper)
Divisions : Faculty of Engineering and Physical Sciences > Electronic Engineering
Authors :
NameEmailORCID
England, Jonathanj.england@surrey.ac.ukUNSPECIFIED
McLaren, M.UNSPECIFIEDUNSPECIFIED
Mitchell, R.UNSPECIFIEDUNSPECIFIED
Uritsky, Y.UNSPECIFIEDUNSPECIFIED
Date : 1997
Identification Number : 10.1109/IIT.1996.586165
Copyright Disclaimer : © 1997 IEEE. Personal use of this material is permitted. Permission from IEEE must be obtained for all other users, including reprinting/ republishing this material for advertising or promotional purposes, creating new collective works for resale or redistribution to servers or lists, or reuse of any copyrighted components of this work in other works.
Uncontrolled Keywords : Ion implantation; Particle measurements; Implants; Position measurement; Size measurement; Information analysis; Morphology; Composite materials; Image converters; Energy measurement
Depositing User : Clive Harris
Date Deposited : 13 Jun 2017 15:16
Last Modified : 13 Jun 2017 15:16
URI: http://epubs.surrey.ac.uk/id/eprint/841372

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