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Reticle imaging and metrology using a CD-SEM at IMEC

Behringer, Uwe F. W., James, A., Felten, F., Polli, M., England, Jonathan, Marschner, Thomas and Vandenberghe, Geert (2000) Reticle imaging and metrology using a CD-SEM at IMEC In: 16th European Conference on Mask Technology for Integrated Circuits and Microcomponents, 15 Nov 1999, Munich, Germany.

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Reticle imaging and metrology are becoming increasingly difficult as reticle features decrease in size. This paper describes some early results of top down CD-SEM reticle imaging and metrology carried out in association with the DUV and 193 nm lithography programs at IMEC. Images of reticle features and some corresponding printed wafer patterns are presented and CD-SEM and optical measurement techniques are compared.

Item Type: Conference or Workshop Item (Conference Paper)
Divisions : Faculty of Engineering and Physical Sciences > Electronic Engineering
Authors :
Behringer, Uwe F. W.
James, A.
Felten, F.
Polli, M.
Marschner, Thomas
Vandenberghe, Geert
Date : 3 February 2000
DOI : 10.1117/12.377102
Copyright Disclaimer : © 2000 COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.
Contributors :
ContributionNameEmailORCID, Uwe F.
Uncontrolled Keywords : Metrology; Reticles; 193nm lithography; Deep ultraviolet; CD-SEM; Photomask; Defects; IMEC
Depositing User : Clive Harris
Date Deposited : 13 Jun 2017 12:55
Last Modified : 16 Jan 2019 18:53

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