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Impact of 193nm Resist Shrinkage on CD-SEM Metrology

Hoffmann, T., Storms, G., Ercken, M., Maenhoudt, M., Pollentier, I., Ronse, K., Felten, F., Wong, E. and England, Jonathan (2001) Impact of 193nm Resist Shrinkage on CD-SEM Metrology In: Interface 2001 Conference, 2001.

Full text not available from this repository.
Item Type: Conference or Workshop Item (Conference Paper)
Divisions : Faculty of Engineering and Physical Sciences > Electronic Engineering
Authors :
NameEmailORCID
Hoffmann, T.UNSPECIFIEDUNSPECIFIED
Storms, G.UNSPECIFIEDUNSPECIFIED
Ercken, M.UNSPECIFIEDUNSPECIFIED
Maenhoudt, M.UNSPECIFIEDUNSPECIFIED
Pollentier, I.UNSPECIFIEDUNSPECIFIED
Ronse, K.UNSPECIFIEDUNSPECIFIED
Felten, F.UNSPECIFIEDUNSPECIFIED
Wong, E.UNSPECIFIEDUNSPECIFIED
England, Jonathanj.england@surrey.ac.ukUNSPECIFIED
Date : 2001
Depositing User : Clive Harris
Date Deposited : 09 Jun 2017 13:49
Last Modified : 09 Jun 2017 13:49
URI: http://epubs.surrey.ac.uk/id/eprint/841347

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