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Techniques for generating three dimensional structures

England, et al. (2015) Techniques for generating three dimensional structures 8,937,019.

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Abstract

Techniques for forming a three dimensional (3D) feature on a substrate are disclosed. In one exemplary embodiment, the technique may be realized as a method comprising: forming a resist structure on the substrate, the resist structure having a first resist portion with a first thickness, a second resist portion with a second thickness, and a third resist portion with a third thickness, where the first thickness may be less than the second thickness, and where the second thickness may be less than the third thickness; implanting charged particles into the substrate through the first and second resist portions and forming an implanted region in the substrate; and etching the substrate to form the 3D feature on the substrate.

Item Type: Patent
Divisions : Faculty of Engineering and Physical Sciences > Electronic Engineering
Authors :
NameEmailORCID
England, Jonathanj.england@surrey.ac.ukUNSPECIFIED
Martin, Patrick M.UNSPECIFIEDUNSPECIFIED
Cox, DavidUNSPECIFIEDUNSPECIFIED
Date : 20 January 2015
Identification Number : 8,937,019
Depositing User : Clive Harris
Date Deposited : 26 May 2017 12:45
Last Modified : 26 May 2017 12:45
URI: http://epubs.surrey.ac.uk/id/eprint/841205

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