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Techniques for reducing effects of photoresist outgassing

Low, et al. (2009) Techniques for reducing effects of photoresist outgassing 7,476,878.

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Abstract

Techniques for reducing effects of photoresist outgassing are disclosed. In one particular exemplary embodiment, the techniques may be realized as an apparatus for reducing effects of photoresist outgassing in an ion implanter. The apparatus may comprise a drift tube located between an end-station and an upstream beamline component. The apparatus may also comprise a first variable aperture between the drift tube and the end-station. The apparatus may further comprise a second variable aperture between the drift tube and the upstream beamline component. The first variable aperture and the second variable aperture can be adjusted to facilitate differential pumping.

Item Type: Patent
Divisions : Faculty of Engineering and Physical Sciences > Electronic Engineering
Authors :
NameEmailORCID
Low, Russell J.UNSPECIFIEDUNSPECIFIED
England, Jonathanj.england@surrey.ac.ukUNSPECIFIED
Krause, Stephen E.UNSPECIFIEDUNSPECIFIED
Hermanson, Eric D.UNSPECIFIEDUNSPECIFIED
Date : 13 January 2009
Identification Number : 7,476,878
Depositing User : Clive Harris
Date Deposited : 26 May 2017 10:38
Last Modified : 26 May 2017 10:38
URI: http://epubs.surrey.ac.uk/id/eprint/841184

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