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Comparison of Ar+ monoatomic and cluster ion sputtering of Ta2O5 at different ion energies, by XPS: Part 2 - Cluster ions

Grilli, R, Simpson, R, Mallinson, CF and Baker, MA (2014) Comparison of Ar+ monoatomic and cluster ion sputtering of Ta2O5 at different ion energies, by XPS: Part 2 - Cluster ions Surface Science Spectra, 21 (1). pp. 68-83.

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Abstract

© 2014 American Vacuum Society.A standard 30 nm thick Ta2O5 oxide layer grown on Ta was examined by XPS after Arn+ cluster ion bombardment at ion energies of 4 keV, 5 keV and 6 keV, with a cluster size of 1000 atoms. The reduction of Ta2O5, resulting from the preferential sputtering of oxygen after ion beam bombardment at different energies has been investigated. Survey spectra, C 1s, Ta 4f and O 1s spectra are presented for each profile at three stages: native surface, after reaching the steady-state oxide composition, and from the underlying metal substrate. It is necessary to reach a voltage of 6 keV to obtain a good sputter rate. The use of the cluster source seems to be promising to reduce the preferential sputtering phenomenon.

Item Type: Article
Authors :
NameEmailORCID
Grilli, Rr.grilli@surrey.ac.ukUNSPECIFIED
Simpson, RUNSPECIFIEDUNSPECIFIED
Mallinson, CFUNSPECIFIEDUNSPECIFIED
Baker, MAm.baker@surrey.ac.ukUNSPECIFIED
Date : 1 January 2014
Identification Number : https://doi.org/10.1116/11.20140702
Depositing User : Symplectic Elements
Date Deposited : 17 May 2017 13:32
Last Modified : 17 May 2017 15:11
URI: http://epubs.surrey.ac.uk/id/eprint/839608

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