University of Surrey

Test tubes in the lab Research in the ATI Dance Research

Comparison of Ar+ monoatomic and cluster ion sputtering of Ta2O5 at different ion energies, by XPS: Part 1 - Monoatomic ions

Grilli, R, Simpson, R, Mallinson, CF and Baker, MA (2014) Comparison of Ar+ monoatomic and cluster ion sputtering of Ta2O5 at different ion energies, by XPS: Part 1 - Monoatomic ions Surface Science Spectra, 21 (1). pp. 50-67.

Full text not available from this repository.

Abstract

© 2014 American Vacuum Society.A standard 30 nm thick Ta2O5 oxide layer grown on Ta was examined by XPS after Ar+ ion bombardment at ion energies of 200 eV, 500 eV, and 3 keV. The reduction of Ta2O5, resulting from the preferential sputtering of oxygen after ion beam bombardment at different energies has been investigated. Survey spectra, C 1s, Ta 4f and O 1s spectra are presented for each profile at three stages: native surface, after reaching the steady-state oxide composition, and from the underlying metal substrate. Reducing the Ar+ energy from 3 keV to 200 eV makes no substantial difference in the degree of Ta2O5 reduction observed following ion bombardment.

Item Type: Article
Authors :
NameEmailORCID
Grilli, Rr.grilli@surrey.ac.ukUNSPECIFIED
Simpson, RUNSPECIFIEDUNSPECIFIED
Mallinson, CFUNSPECIFIEDUNSPECIFIED
Baker, MAm.baker@surrey.ac.ukUNSPECIFIED
Date : 1 January 2014
Identification Number : 10.1116/11.20140701
Depositing User : Symplectic Elements
Date Deposited : 17 May 2017 13:32
Last Modified : 17 May 2017 15:11
URI: http://epubs.surrey.ac.uk/id/eprint/839607

Actions (login required)

View Item View Item

Downloads

Downloads per month over past year


Information about this web site

© The University of Surrey, Guildford, Surrey, GU2 7XH, United Kingdom.
+44 (0)1483 300800