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APPLICATION OF THE TRUNCATED TWO-PIECE NORMAL DISTRIBUTION TO THE MEASUREMENT OF DEPTHS OF ARSENIC IMPLANTS IN SILICON.

Kimber, AC and Jeynes, C (1987) APPLICATION OF THE TRUNCATED TWO-PIECE NORMAL DISTRIBUTION TO THE MEASUREMENT OF DEPTHS OF ARSENIC IMPLANTS IN SILICON. Journal of the Royal Statistical Society. Series C: Applied Statistics, 36 (3). pp. 352-357.

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Abstract

The truncated two-piece normal distribution is applied to data obtained from backscattering experiments in order to investigate the depth of arsenic implants in silicon.

Item Type: Article
Authors :
NameEmailORCID
Kimber, ACUNSPECIFIEDUNSPECIFIED
Jeynes, Cc.jeynes@surrey.ac.ukUNSPECIFIED
Date : 1 December 1987
Depositing User : Symplectic Elements
Date Deposited : 17 May 2017 12:53
Last Modified : 17 May 2017 15:06
URI: http://epubs.surrey.ac.uk/id/eprint/837149

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