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Factors Influencing the Minority Carrier Diffusion Length in Multicrystalline Silicon Produced in a HEM Furnace

Heasman, KC, Lesniak, M, Neville, BM, Hughes, AE, Cunningham, DW, Mitchell, AM, Ford, BE, Summers, JG and Bruton, TM (1991) Factors Influencing the Minority Carrier Diffusion Length in Multicrystalline Silicon Produced in a HEM Furnace In: 22rd IEEE PV Spec. Conference, 1991-10-07 - 1991-10-11, Las Vegas.

Full text not available from this repository.
Item Type: Conference or Workshop Item (UNSPECIFIED)
Authors :
NameEmailORCID
Heasman, KCk.heasman@surrey.ac.ukUNSPECIFIED
Lesniak, MUNSPECIFIEDUNSPECIFIED
Neville, BMUNSPECIFIEDUNSPECIFIED
Hughes, AEUNSPECIFIEDUNSPECIFIED
Cunningham, DWUNSPECIFIEDUNSPECIFIED
Mitchell, AMUNSPECIFIEDUNSPECIFIED
Ford, BEUNSPECIFIEDUNSPECIFIED
Summers, JGUNSPECIFIEDUNSPECIFIED
Bruton, TMUNSPECIFIEDUNSPECIFIED
Date : 11 October 1991
Identification Number : 10.1109/PVSC.1991.169362
Contributors :
ContributionNameEmailORCID
publisherIEEE, UNSPECIFIEDUNSPECIFIED
Depositing User : Symplectic Elements
Date Deposited : 17 May 2017 12:50
Last Modified : 17 May 2017 15:06
URI: http://epubs.surrey.ac.uk/id/eprint/836943

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