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Lattice locations of erbium implants in silicon

Tang, YS, Zhang, J, Heasman, KC and Sealy, BJ (1989) Lattice locations of erbium implants in silicon Solid State Communications, 72 (10). pp. 991-993.

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Abstract

The lattice locations of erbium implanted in silicon were studied by backscattering angular scanning in combination with photoluminescence measurements. The results show that the positions of erbium implants depend on annealing conditions and have tetrahedral and/or orthorhombic symmetries in different cases. © 1989.

Item Type: Article
Authors :
NameEmailORCID
Tang, YSUNSPECIFIEDUNSPECIFIED
Zhang, JUNSPECIFIEDUNSPECIFIED
Heasman, KCk.heasman@surrey.ac.ukUNSPECIFIED
Sealy, BJUNSPECIFIEDUNSPECIFIED
Date : 1 January 1989
Identification Number : 10.1016/0038-1098(89)90614-5
Depositing User : Symplectic Elements
Date Deposited : 17 May 2017 12:41
Last Modified : 17 May 2017 15:05
URI: http://epubs.surrey.ac.uk/id/eprint/836316

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