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A route for periodic nanodot fabrication in substrates using nanochanel alumina membranes as masks for ion implantation

Guan, W, Li, W, Ghatak, J, Peng, N, Peng, Y, Bhatta, UM, Inkson, BJ and Mobus, G (2012) A route for periodic nanodot fabrication in substrates using nanochanel alumina membranes as masks for ion implantation Proceedings of the IEEE Conference on Nanotechnology.

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Abstract

Progress in ion implantation of metal ions into substrates of amorphous silica or Si-nitride with respect to lateral periodic patterning is presented. We use a 2D-nanoporous membrane of anodic aluminium oxide (AAO) as mask to conduct the Co ion implantations. The criteria for successful masked implantation and main problems are presented, including testing of the masks in a focused ion beam (FIB) system. It is proposed that electron transparent thin windows are the most suitable substrate for methods development, as TEM observation can be followed without any further sample milling. Co clusters are found to exhibit the same lateral order as the pores, and first annealing tests to achieve Co nanoparticles are shown using an in-situ heating TEM holder. © 2012 IEEE.

Item Type: Article
Authors :
NameEmailORCID
Guan, WUNSPECIFIEDUNSPECIFIED
Li, WUNSPECIFIEDUNSPECIFIED
Ghatak, JUNSPECIFIEDUNSPECIFIED
Peng, Nn.peng@surrey.ac.ukUNSPECIFIED
Peng, YUNSPECIFIEDUNSPECIFIED
Bhatta, UMUNSPECIFIEDUNSPECIFIED
Inkson, BJUNSPECIFIEDUNSPECIFIED
Mobus, GUNSPECIFIEDUNSPECIFIED
Date : 22 November 2012
Identification Number : 10.1109/NANO.2012.6322227
Depositing User : Symplectic Elements
Date Deposited : 17 May 2017 12:38
Last Modified : 17 May 2017 15:05
URI: http://epubs.surrey.ac.uk/id/eprint/836111

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