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LONG-RANGE CHANNELING IN LOW-ENERGY ION-IMPLANTATION INTO SILICON

SMITH, R and WEBB, RP (1991) LONG-RANGE CHANNELING IN LOW-ENERGY ION-IMPLANTATION INTO SILICON PHILOSOPHICAL MAGAZINE LETTERS, 64 (5). pp. 253-260.

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Item Type: Article
Authors :
NameEmailORCID
SMITH, RUNSPECIFIEDUNSPECIFIED
WEBB, RPr.webb@surrey.ac.ukUNSPECIFIED
Date : 1 November 1991
Identification Number : https://doi.org/10.1080/09500839108214619
Uncontrolled Keywords : Science & Technology, Physical Sciences, Physics, Condensed Matter, Physics, PHYSICS, CONDENSED MATTER, KEV PARTICLE BOMBARDMENT, SIMULATION, GROWTH
Related URLs :
Depositing User : Symplectic Elements
Date Deposited : 17 May 2017 12:19
Last Modified : 17 May 2017 15:03
URI: http://epubs.surrey.ac.uk/id/eprint/834836

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