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Implantation of silicon using the boron cluster BF2

Smith, R, Harrison, M and Webb, R (1999) Implantation of silicon using the boron cluster BF2 THIN SOLID FILMS, 343. pp. 602-604.

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Item Type: Article
Authors :
NameEmailORCID
Smith, RUNSPECIFIEDUNSPECIFIED
Harrison, MUNSPECIFIEDUNSPECIFIED
Webb, Rr.webb@surrey.ac.ukUNSPECIFIED
Date : 1 April 1999
Identification Number : 10.1016/S0040-6090(98)01714-3
Uncontrolled Keywords : Science & Technology, Technology, Physical Sciences, Materials Science, Multidisciplinary, Materials Science, Coatings & Films, Physics, Applied, Physics, Condensed Matter, Materials Science, Physics, MATERIALS SCIENCE, COATINGS & FILMS, MATERIALS SCIENCE, MULTIDISCIPLINARY, PHYSICS, APPLIED, PHYSICS, CONDENSED MATTER, cluster beams, ion implantation, molecular dynamics, MOLECULAR-DYNAMICS
Related URLs :
Depositing User : Symplectic Elements
Date Deposited : 17 May 2017 12:18
Last Modified : 17 May 2017 15:03
URI: http://epubs.surrey.ac.uk/id/eprint/834803

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