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Ultrashallow junctions in Si using decaborane? A molecular dynamics simulation study

Smith, R, Shaw, M, Webb, RP and Foad, MA (1998) Ultrashallow junctions in Si using decaborane? A molecular dynamics simulation study JOURNAL OF APPLIED PHYSICS, 83 (6). pp. 3148-3152.

Full text not available from this repository.
Item Type: Article
Authors :
NameEmailORCID
Smith, RUNSPECIFIEDUNSPECIFIED
Shaw, MUNSPECIFIEDUNSPECIFIED
Webb, RPr.webb@surrey.ac.ukUNSPECIFIED
Foad, MAUNSPECIFIEDUNSPECIFIED
Date : 15 March 1998
Identification Number : 10.1063/1.367072
Uncontrolled Keywords : Science & Technology, Physical Sciences, Physics, Applied, Physics, PHYSICS, APPLIED, POTENTIALS, SILICON, SYSTEMS
Related URLs :
Depositing User : Symplectic Elements
Date Deposited : 17 May 2017 12:17
Last Modified : 17 May 2017 15:02
URI: http://epubs.surrey.ac.uk/id/eprint/834754

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