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Very low energy implanted Bragg gratings in SOI for wafer scale testing applications

Loiacono, R, Topley, R, Nakyobe, A, Mashanovich, G, Gwilliam, R, Lulli, G, Feldesh, R, Jones, R and Reed, G (2011) Very low energy implanted Bragg gratings in SOI for wafer scale testing applications In: 8th IEEE GFP, 2010-09-14 - 2010-09-16, London, UK.

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Abstract

We present Bragg gratings with an effective index change introduced by implanting germanium at only 15KeV. An extinction ratio of 35dB at 1350nm is demonstrated for device lengths of 600μm, furthermore laser annealing is demonstrated.

Item Type: Conference or Workshop Item (UNSPECIFIED)
Authors :
NameEmailORCID
Loiacono, RUNSPECIFIEDUNSPECIFIED
Topley, RUNSPECIFIEDUNSPECIFIED
Nakyobe, AUNSPECIFIEDUNSPECIFIED
Mashanovich, Gg.mashanovich@surrey.ac.ukUNSPECIFIED
Gwilliam, Rr.gwilliam@surrey.ac.ukUNSPECIFIED
Lulli, GUNSPECIFIEDUNSPECIFIED
Feldesh, RUNSPECIFIEDUNSPECIFIED
Jones, RUNSPECIFIEDUNSPECIFIED
Reed, GUNSPECIFIEDUNSPECIFIED
Date : 2011
Identification Number : https://doi.org/10.1109/GROUP4.2011.6053712
Contributors :
ContributionNameEmailORCID
publisherIEEE, UNSPECIFIEDUNSPECIFIED
Depositing User : Symplectic Elements
Date Deposited : 17 May 2017 12:17
Last Modified : 17 May 2017 15:02
URI: http://epubs.surrey.ac.uk/id/eprint/834737

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