Chicane deceleration - An innovative energy contamination control technique in low energy ion implantation
White, N, Chen, J, Mulcahy, C, Biswas, S and Gwilliam, R (2006) Chicane deceleration - An innovative energy contamination control technique in low energy ion implantation AIP Conference Proceedings, 866. pp. 335-339.
Full text not available from this repository.Abstract
High current beams suitable for USJ implantation were generated by 'Chicane Deceleration' involving an s-bend to block contaminants. Implanted wafers were analyzed with 200eV O2+ beams at 45° to resolve the sources of dopant profile variation in fine detail. Energy contamination is essentially eliminated, but for B+ channeling remains important. Unannealed Xj values from 5 to 7 nm are reported for different implant species. © 2006 American Institute of Physics.
Item Type: | Article | ||||||||||||||||||
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Divisions : | Surrey research (other units) | ||||||||||||||||||
Authors : |
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Date : | 1 December 2006 | ||||||||||||||||||
Depositing User : | Symplectic Elements | ||||||||||||||||||
Date Deposited : | 17 May 2017 12:02 | ||||||||||||||||||
Last Modified : | 24 Jan 2020 21:36 | ||||||||||||||||||
URI: | http://epubs.surrey.ac.uk/id/eprint/833717 |
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