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Process characterization of low temperature ion implantation using ribbon beam and spot beam on the AIBT iPulsar high current

Collart, EJH, Teel, R, Free, C, Wan, Z, Kopalidis, P, Razali, MA, Gwilliam, R, Smith, A, Tsidilkovski, E and Karpowicz, T (2010) Process characterization of low temperature ion implantation using ribbon beam and spot beam on the AIBT iPulsar high current AIP Conference Proceedings, 1321. pp. 49-52.

Full text not available from this repository.
Item Type: Article
Authors :
NameEmailORCID
Collart, EJHUNSPECIFIEDUNSPECIFIED
Teel, RUNSPECIFIEDUNSPECIFIED
Free, CUNSPECIFIEDUNSPECIFIED
Wan, ZUNSPECIFIEDUNSPECIFIED
Kopalidis, PUNSPECIFIEDUNSPECIFIED
Razali, MAUNSPECIFIEDUNSPECIFIED
Gwilliam, Rr.gwilliam@surrey.ac.ukUNSPECIFIED
Smith, AUNSPECIFIEDUNSPECIFIED
Tsidilkovski, EUNSPECIFIEDUNSPECIFIED
Karpowicz, TUNSPECIFIEDUNSPECIFIED
Date : 2010
Identification Number : https://doi.org/10.1063/1.3548462
Depositing User : Symplectic Elements
Date Deposited : 17 May 2017 12:02
Last Modified : 17 May 2017 15:00
URI: http://epubs.surrey.ac.uk/id/eprint/833710

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