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Nonconventional flash annealing on shallow indium implants in silicon

Gennaro, S, Giubertoni, D, Bersani, M, Foggiato, J, Yoo, WS and Gwilliam, R (2006) Nonconventional flash annealing on shallow indium implants in silicon In: 8th International Workshop on Fabrication, Characterization, and Modeling of Ultra-Shallow Doping Profiles in Semiconductors, 2005-06-05 - 2005-06-08, Daytona Beach, FL.

Full text not available from this repository.
Item Type: Conference or Workshop Item (UNSPECIFIED)
Authors :
NameEmailORCID
Gennaro, SUNSPECIFIEDUNSPECIFIED
Giubertoni, DUNSPECIFIEDUNSPECIFIED
Bersani, MUNSPECIFIEDUNSPECIFIED
Foggiato, JUNSPECIFIEDUNSPECIFIED
Yoo, WSUNSPECIFIEDUNSPECIFIED
Gwilliam, Rr.gwilliam@surrey.ac.ukUNSPECIFIED
Date : 1 January 2006
Identification Number : 10.1116/1.2132321
Contributors :
ContributionNameEmailORCID
publisherA V S AMER INST PHYSICS, UNSPECIFIEDUNSPECIFIED
Uncontrolled Keywords : Science & Technology, Technology, Physical Sciences, Engineering, Electrical & Electronic, Nanoscience & Nanotechnology, Physics, Applied, Engineering, Science & Technology - Other Topics, Physics, ENGINEERING, ELECTRICAL & ELECTRONIC, NANOSCIENCE & NANOTECHNOLOGY, PHYSICS, APPLIED, TRANSIENT ENHANCED DIFFUSION, ELECTRICAL ACTIVATION, CARBON, SI, JUNCTIONS
Related URLs :
Depositing User : Symplectic Elements
Date Deposited : 17 May 2017 12:01
Last Modified : 17 May 2017 15:00
URI: http://epubs.surrey.ac.uk/id/eprint/833709

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