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Enhancing the field emission properties of amorphous carbon films by thermal annealing

Burden, AP, Forrest, RD and Silva, SRP (1999) Enhancing the field emission properties of amorphous carbon films by thermal annealing THIN SOLID FILMS, 337 (1-2). pp. 257-260.

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Item Type: Article
Authors :
NameEmailORCID
Burden, APUNSPECIFIEDUNSPECIFIED
Forrest, RDUNSPECIFIEDUNSPECIFIED
Silva, SRPs.silva@surrey.ac.ukUNSPECIFIED
Date : 11 January 1999
Identification Number : https://doi.org/10.1016/S0040-6090(98)01385-6
Uncontrolled Keywords : Science & Technology, Technology, Physical Sciences, Materials Science, Multidisciplinary, Materials Science, Coatings & Films, Physics, Applied, Physics, Condensed Matter, Materials Science, Physics, MATERIALS SCIENCE, COATINGS & FILMS, MATERIALS SCIENCE, MULTIDISCIPLINARY, PHYSICS, APPLIED, PHYSICS, CONDENSED MATTER, amorphous hydrogenated carbon, amorphous semiconductor, plasma enhanced chemical vapour deposition, annealing, field emission, FED, CATHODES
Related URLs :
Depositing User : Symplectic Elements
Date Deposited : 17 May 2017 11:48
Last Modified : 17 May 2017 14:59
URI: http://epubs.surrey.ac.uk/id/eprint/832777

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