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A study of the effects of nitrogen incorporation and annealing on the properties of hydrogenated amorphous carbon films

Khan, RUA, Burden, AP, Silva, SRP, Shannon, JM and Sealy, BJ (1999) A study of the effects of nitrogen incorporation and annealing on the properties of hydrogenated amorphous carbon films In: Symposium K on Carbon-Based Materials for Microelectronics of the European-Materials-Research-Society-Meeting, 1998-06-16 - 1998-06-19, STRASBOURG, FRANCE.

Full text not available from this repository.
Item Type: Conference or Workshop Item (UNSPECIFIED)
Authors :
NameEmailORCID
Khan, RUAUNSPECIFIEDUNSPECIFIED
Burden, APUNSPECIFIEDUNSPECIFIED
Silva, SRPs.silva@surrey.ac.ukUNSPECIFIED
Shannon, JMUNSPECIFIEDUNSPECIFIED
Sealy, BJUNSPECIFIEDUNSPECIFIED
Date : 1 January 1999
Identification Number : https://doi.org/10.1016/S0008-6223(98)00269-3
Contributors :
ContributionNameEmailORCID
publisherPERGAMON-ELSEVIER SCIENCE LTD, UNSPECIFIEDUNSPECIFIED
Uncontrolled Keywords : Science & Technology, Physical Sciences, Technology, Chemistry, Physical, Materials Science, Multidisciplinary, Chemistry, Materials Science, CHEMISTRY, PHYSICAL, MATERIALS SCIENCE, MULTIDISCIPLINARY, amorphous carbon, plasma deposition, chemical vapour deposition, annealing, electrical properties, THIN-FILMS
Related URLs :
Depositing User : Symplectic Elements
Date Deposited : 17 May 2017 11:48
Last Modified : 17 May 2017 14:59
URI: http://epubs.surrey.ac.uk/id/eprint/832776

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