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Thermal stability of plasma deposited thin films of hydrogenated carbon-nitrogen alloys

Anguita, JV, Silva, SRP, Burden, AP, Sealy, BJ, Haq, S, Hebbron, M, Sturland, I and Pritchard, A (1999) Thermal stability of plasma deposited thin films of hydrogenated carbon-nitrogen alloys JOURNAL OF APPLIED PHYSICS, 86 (11). pp. 6276-6281.

Full text not available from this repository.
Item Type: Article
Authors :
NameEmailORCID
Anguita, JVUNSPECIFIEDUNSPECIFIED
Silva, SRPs.silva@surrey.ac.ukUNSPECIFIED
Burden, APUNSPECIFIEDUNSPECIFIED
Sealy, BJUNSPECIFIEDUNSPECIFIED
Haq, SUNSPECIFIEDUNSPECIFIED
Hebbron, MUNSPECIFIEDUNSPECIFIED
Sturland, IUNSPECIFIEDUNSPECIFIED
Pritchard, AUNSPECIFIEDUNSPECIFIED
Date : 1 December 1999
Identification Number : https://doi.org/10.1063/1.371685
Uncontrolled Keywords : Science & Technology, Physical Sciences, Physics, Applied, Physics, PHYSICS, APPLIED, TETRAHEDRAL AMORPHOUS-CARBON, OPTICAL-PROPERTIES, NITRIDE, DISCHARGE
Related URLs :
Depositing User : Symplectic Elements
Date Deposited : 17 May 2017 11:48
Last Modified : 17 May 2017 14:59
URI: http://epubs.surrey.ac.uk/id/eprint/832774

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