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Electron field emission from amorphous carbon films as a function of deposition self bias, nitrogen content and substrate resistivity - experiment and simulation

Forrest, RD, Chen, GY and Silva, SRP (2001) Electron field emission from amorphous carbon films as a function of deposition self bias, nitrogen content and substrate resistivity - experiment and simulation In: Taiwan Diamond 2000 Meeting, 2000-07-30 - 2000-08-02, INST ATOMIC MOLECULAR SCI ACAD SINICA, TAIPEI, TAIWAN.

Full text not available from this repository.
Item Type: Conference or Workshop Item (UNSPECIFIED)
Authors :
NameEmailORCID
Forrest, RDUNSPECIFIEDUNSPECIFIED
Chen, GYUNSPECIFIEDUNSPECIFIED
Silva, SRPs.silva@surrey.ac.ukUNSPECIFIED
Date : 1 November 2001
Identification Number : 10.1016/S0254-0584(01)00437-0
Contributors :
ContributionNameEmailORCID
publisherELSEVIER SCIENCE SA, UNSPECIFIEDUNSPECIFIED
Uncontrolled Keywords : Science & Technology, Technology, Materials Science, Multidisciplinary, Materials Science, MATERIALS SCIENCE, MULTIDISCIPLINARY, CVD, field emission, amorphous materials
Related URLs :
Depositing User : Symplectic Elements
Date Deposited : 17 May 2017 11:48
Last Modified : 17 May 2017 14:59
URI: http://epubs.surrey.ac.uk/id/eprint/832754

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