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Surface induced bulk modifications of amorphous carbon nitride films by post-deposition oxygen and hydrogen plasma treatment

Miyajima, Y, Nitta, S, Silva, SRP and Zeze, DA (2005) Surface induced bulk modifications of amorphous carbon nitride films by post-deposition oxygen and hydrogen plasma treatment THIN SOLID FILMS, 491 (1-2). pp. 161-167.

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Item Type: Article
Authors :
NameEmailORCID
Miyajima, YUNSPECIFIEDUNSPECIFIED
Nitta, SUNSPECIFIEDUNSPECIFIED
Silva, SRPs.silva@surrey.ac.ukUNSPECIFIED
Zeze, DAUNSPECIFIEDUNSPECIFIED
Date : 22 November 2005
Identification Number : https://doi.org/10.1016/j.tsf.2005.06.033
Uncontrolled Keywords : Science & Technology, Technology, Physical Sciences, Materials Science, Multidisciplinary, Materials Science, Coatings & Films, Physics, Applied, Physics, Condensed Matter, Materials Science, Physics, MATERIALS SCIENCE, COATINGS & FILMS, MATERIALS SCIENCE, MULTIDISCIPLINARY, PHYSICS, APPLIED, PHYSICS, CONDENSED MATTER, amorphous carbon nitride, X-ray photoelectron spectroscopy, optical properties, sputtering, THIN-FILMS, DEPOSITION, XPS
Related URLs :
Depositing User : Symplectic Elements
Date Deposited : 17 May 2017 11:47
Last Modified : 17 May 2017 14:58
URI: http://epubs.surrey.ac.uk/id/eprint/832735

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