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Comparison of the ablation plumes arising from ArF laser ablation of graphite, silicon, copper, and aluminum in vacuum

Claeyssens, F, Henley, SJ and Ashfold, MNR (2003) Comparison of the ablation plumes arising from ArF laser ablation of graphite, silicon, copper, and aluminum in vacuum JOURNAL OF APPLIED PHYSICS, 94 (4). pp. 2203-2211.

Full text not available from this repository.
Item Type: Article
Authors :
NameEmailORCID
Claeyssens, FUNSPECIFIEDUNSPECIFIED
Henley, SJs.henley@surrey.ac.ukUNSPECIFIED
Ashfold, MNRUNSPECIFIEDUNSPECIFIED
Date : 15 August 2003
Identification Number : https://doi.org/10.1063/1.1592294
Uncontrolled Keywords : Science & Technology, Physical Sciences, Physics, Applied, Physics, PHYSICS, APPLIED, MASS-SPECTROMETRY, PLASMA PLUMES, KNUDSEN-LAYER, THIN-FILMS, DEPOSITION, TEMPERATURE, EXCIMER, VAPORIZATION, EXPANSION, DYNAMICS
Related URLs :
Depositing User : Symplectic Elements
Date Deposited : 17 May 2017 11:32
Last Modified : 17 May 2017 14:57
URI: http://epubs.surrey.ac.uk/id/eprint/831771

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